Thierry Czerwiec,
Ecole des Mines Nancy, France |
Plasma and ion assisted diffusion treatments: nitriding, carburizing and nitrocarburizing |
Doriana Dimova−Malinovska,
Bulg Acad Sci, Bulgaria |
Structural and optical properties of poly-Si thin films obtained by the method of metal induced crystallization |
Gheorghe Dinescu,
Nat Inst Laser, Plasma and Radiation Phys, Romania |
Surface modification and film deposition with expanding RF plasmas at atmospheric and low pressure |
Arutiun Ehiasarian,
Sheffield Hallam U, UK | Progress in HIPIMS technology |
Stefan Facsko,
FZD, Germany | Ion-induced surface patterns as templates for thin film growth |
Ulf Helmersson,
U Linköping, Sweden | Ionized-PVD with HiPIMS - the future of sputter deposition? |
Papken Hovsepian,
Sheffield Hallam U, UK | New generation nanostructured coatings to perform in severe high temperature environment |
Ilia Katardjiev,
U Uppsala, Sweden | Thin film electroacoustics - current status and trends |
Henning Lebius,
CIMAP Caen, France | Surface patterns by high-energy ions |
Nikolay Nedjalkov,
Bulg Acad Sci, Bulgaria | Gold nanoparticles as nanoheaters and nanolenses in the processing of different substrate surfaces |
Ivan Petrov,
U Illinois, USA | Advances in electron microscopy |
Tsvjatko Popov,
Sofia U, Bulgaria | Plasma potential and electron energy distribution function measured by Langmuir probe in magnetized plasma |
Bernd Rauschenbach,
IOM Leipzig, Germany | Self-organized nanostructuring on semiconductor surfaces by low-energy ion bombardment |
M.C.M. van de Sanden,
TU Eindhoven, The Netherlands | Thin film and plasma technology for photovoltaics: from fundamentals to industrial application |
Daniel C. Schram,
TU Eindhoven, The Netherlands | Plasma nature and plasma processing |
Mykola Vinnichenko,
FZD, Germany | Properties of transparent conductive oxides deposited by magnetron sputtering |
Rositza Yakimova,
U Linköping, Sweden | Epitaxial graphene on SiC substrates |
