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16th INTERNATIONAL SUMMER SCHOOL VEIT'2009 - Invited Speakers
VEIT 2009

   
SIXTEENTH INTERNATIONAL SUMMER SCHOOL
ON VACUUM, ELECTRON,
AND ION TECHNOLOGIES

28 September−2 October 2009, Sunny Beach, Bulgaria
   

    

INVITED SPEAKERS AND TOPICS

Thierry Czerwiec,
Ecole des Mines Nancy, France
Plasma and ion assisted diffusion treatments: nitriding, carburizing and nitrocarburizing
Doriana Dimova−Malinovska,
Bulg Acad Sci, Bulgaria
Structural and optical properties of poly-Si thin films obtained by the method of metal induced crystallization
Gheorghe Dinescu,
Nat Inst Laser, Plasma and Radiation Phys, Romania
Surface modification and film deposition with expanding RF plasmas at atmospheric and low pressure
Arutiun Ehiasarian,
Sheffield Hallam U, UK
Progress in HIPIMS technology
Stefan Facsko,
FZD, Germany
Ion-induced surface patterns as templates for thin film growth
Ulf Helmersson,
U Linköping, Sweden
Ionized-PVD with HiPIMS - the future of sputter deposition?
Papken Hovsepian,
Sheffield Hallam U, UK
New generation nanostructured coatings to perform in severe high temperature environment
Ilia Katardjiev,
U Uppsala, Sweden
Thin film electroacoustics - current status and trends
Henning Lebius,
CIMAP Caen, France
Surface patterns by high-energy ions
Nikolay Nedjalkov,
Bulg Acad Sci, Bulgaria
Gold nanoparticles as nanoheaters and nanolenses in the processing of different substrate surfaces
Ivan Petrov,
U Illinois, USA
Advances in electron microscopy
Tsvjatko Popov,
Sofia U, Bulgaria
Plasma potential and electron energy distribution function measured by Langmuir probe in magnetized plasma
Bernd Rauschenbach,
IOM Leipzig, Germany
Self-organized nanostructuring on semiconductor surfaces by low-energy ion bombardment
M.C.M. van de Sanden,
TU Eindhoven, The Netherlands
Thin film and plasma technology for photovoltaics: from fundamentals to industrial application
Daniel C. Schram,
TU Eindhoven, The Netherlands
Plasma nature and plasma processing
Mykola Vinnichenko,
FZD, Germany
Properties of transparent conductive oxides deposited by magnetron sputtering
Rositza Yakimova,
U Linköping, Sweden
Epitaxial graphene on SiC substrates

    

   

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VEIT 2009 is jointly organised by

Institute of Electronics, Bulgarian Academy of Sciences, Sofia, Bulgaria

Institute of Ion Beam Physics and Materials Research,
Forschungszentrum Dresden-Rossendorf, Dresden, Germany